Asianometry asmls zerodefect euv mask challenge
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Загружено автоматически через бота оригинал asianometry оригинальное описание
asml and its partners had to overcome many challenges in order to make euv lithography a reality.
for instance in a previous video i talked about the euv light source and its doubleshot technique. but while challenging that had not been considered one of euvs dealbreaking issues.
a greater struggle was how to achieve a zero defect rate for the euv photomask or reticle. i will use the two terms interchangeably here.
the euv reticle contains the chip design. any defects on the reticle larger than a certain size will show up on the printed wafers themselves. so in order for it to work it must be truly perfect.
in this video we look at how asml managed to overcome this ultracritical aspect of the technology.
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